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消耗品及び副資材/Processing Supply

Abrasive

画像:研削材/Abrasive

Artificial abrasive is classified into alumina group (A・WA) or silicon carbide group (C・GC). These abrasive are used properly by hardness and friability. We prepare many kinds of material, mesh and grade for grinding stone, fire brick, sand blast, wire saw cutting and many other purposes.

 

Polishing powder

Cerium Oxide

画像:研磨材/Polishing powder

A series of LUMINOX-TE is made from rare-earth carbonate.So it's cerium purity is very high. Because of the high mechanochemical effect, you can get high polishing rate and fine surface roughness. We prepare many kinds of special item for LCD Glass, Glass HDD Substrate, Photomask, Optical Lens, Quartz Crystal, TV Braun Tube, Beveling of Mirror and any other polishing of glass.

Polishing Slurry

Polishing of electronic device which CMP typify extends possibility and application of polishing . In the future"Polishing" will become one of the most important technology.
We prepare Colloidal Silica, Zirconia, Alumina, Diamond and many kinds of polishing slurry.

液状研磨材/Polishing Slurry

Pad other supplies

画像:パッドその他副資材/Pad other supplies

Pad , Lubricant and the other sub-materials are also
important as much as polishing powder. We prepare Cerium pad, Suede pad, Buff, Carrier, Cutting oil, Lapping oil, Dispersant, Pitch, Coating material etc.

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製品のご案内

  • Alumina Fine Abrasive
  • Silicon Carbide Fine Abrasive
  • High Purity Alumina Abrasive
  • Processing Machine and Related Equipment
  • Grinding Wheel
  • Processing Supply